Dr. KALYA Shubhakar

Shubhakar Kalya obtained his Master’s degree in Microelectronics from Indian Institute of Science (IISc), Bangalore, India in 2007 and PhD degree from Nanyang Technological University (NTU), Singapore in 2012/13. During his doctoral studies at NTU, he worked on Nanoscale characterization of High-κ gate dielectrics for reliability and failure analysis. He has also worked as a researcher at Institute of Materials and Research Engineering (IMRE), Singapore from July 2009 to December 2011, and was involved in research related to characterization of High-κ gate dielectrics using scanning tunneling microscopy and atomic force microscopy.

His research interests are in nanoscale characterization and analysis of High-κ gate dielectrics for logic and memory devices, and failure analysis of nanoscale electronic devices. He was a Visiting Scientist at Massachusetts Institute of Technology (MIT), Cambridge, USA in Electrical Engineering and Computer Science (EECS) Department from January to June 2017. Currently, he is working as a Lecturer at Singapore University of Technology (SUTD), Singapore.